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| VE-160 PVD Coating System |
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This thin film tool has a wide range of uses, including solar, optical, battery, fuel cell, semiconductor, and nanotechnology applications. It is ideal for laboratories, university instruction, research & development, prototyping, and production. With a small footprint, it is compatible with cleanroom operation and maintenance.
Features
■ Multiple sources all available in the same chamber:
• e-Gun electron beam evaporation • Sputtering • Resistive deposition
■ Sources and utilities mounted on a single flange for simple swap and maintenance.
■ Source-to-substrate distance up to 24”, ideal for high-uniformity and liftoff processes.
■ PC Control System
■ Less than 15 minutes from atmosphere to process pressure of 10e-6 Torr.
■ Modular, expandable design with choice of “standard options.”
■ Easy access through 20” X 19” door to large 16” X 16” X 35” work space.
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| Specifications |
| Deposition sources |
• 3 kW, 6 kW, and/or 10 kW e-Gun evaporation sources
• DC and RF sputtering sources up to 10kW available
• 1kVA and 2kVA dual resistive evaporation sources available |
| Source Mounting |
e-Gun and sputtering sources and utilities are mounted on a single flange for quick change or replacement. Resistive evaporation sources can be mounted on either of two levels of ports provided. |
| Chamber work space |
16” X 16” X 35” |
| Substrate flange |
ISO quick access |
| Vacuum process chamber |
304 stainless steel, “D” style chamber with hinged front door. |
| Cycle time |
Less than 15 minutes from atmosphere to process pressure of 10e-6 Torr |
| Ports |
Spare ports for installation of all standard options |
| Electrical |
220 VAC 3-phase or 400 VAC 3-phase |
| Water |
1.5 gpm to 3 gpm, depending on source selection. Water flow is factory interlocked for proper flow rate. |
| Air |
60 psi air supply |
| Finish |
Cleanroom compatible paint finish |
| Dimensions |
Overall dimensions 24”L X 44”W X 68.5”H (61cm L X 112 cm W X 174 cm H) |
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| VE-90 Resistive Vacuum Coating System |
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The VE-90 is an economical system ideally suited to resistive coating applications. Its straightforward controls and rapid cycle time enhance productivity. Reliable coating chores are accomplished in a high vacuum environment that is available in about ten minutes from atmosphere with the touch of a single button.
| Specifications |
| Evaporation System |
• 1 kVA resistive evaporation source
• 2 switch-selectable pairs of baseplate feedthroughs
• Digital ammeter readout |
| Pressure Instrumentation |
• Digital ionization gauge
• Digital Convectron gauge |
| Vacuum System |
• 12” x 12” Pyrex bell jar
• Dual-stage mechanical pump
• Turbomolecular pump
• Automatic pumpdown with source interlocks |
| Utilities |
115/220 VAC at 20 A |
| Physical Specifications |
• Tubular steel frame with casters and side panels
• 30” L x 20” W x 42” H
• Approx. 250 lbs. |
| Options |
• 2 kVA resistive evaporation package
• Substrate fixture
• Substrate shutter
• Thickness monitor |
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